Tuesday, March 27, 2018


Vani Institute Students as usual this time too have rocked and achieved the best results in GATE.2018 (Graduate Aptitude test in engineering) recently conducted at national level. On this jubilant occasion, the Head of Vani Institutes Sri Pellakuru Srinivasulu Reddy commended all those students who got the top ranks. VANI students excelled and achieved top ranks in Gate 2018 Exams conducted on line on February 3,4,10 and 11. It will felicitate the eligible students get admission in the prestigious educational
institutions and they can pursue M tech and PhD courses based on the marks scored in Gate Exams conducted collectively by IISC and IIT’s and NIT’s.
Almost 80 per cent of students who wrote GATE exam conducted by IIT Guwahati this year belong to MECHANICAL, ECE, EEE and CIVIL branches.
WhatsApp Image 2018-03-24 at 3.42.58 PM
Vani Institute students Juggernaut on:
Akash Chouksey 1st rank (CE),Namita karla 1 st Rank (CS), Mainul Haque got 2nd rank(IN), Pinaki mondal 3rd rank(EE), vidyanshu 3 rd rank (PI),Sharad Kumar 4th rank (Ec), Ramesh Kamulla 4th rank(IN), M Biswajith 5th rank (ME),Lohith Kaayal 6th Rank (CH) , Sumit Dal 6th Rank (PI), Somya Bhatnagar 6th rank(IN), K. Rishab 8th rank (CH), Y.Sasank 9th rank (CE) ,Chandrasish majumdar 9th rank (CS), Vipin Chandragupta 10th rank(IN) Raghunath 13 th (EE), shivam singh 14 th rank (CE),swaraj Kumar 17 th rank (CE), Rahul gupta 19 th rank (CE). Below 20ranks- 20 RANKS and within 100ranks 78 students proved their talent. Vani Institutes chief Pellakuru Srinivasulu Reddy announced it in a Press release
 Akash CHOUKSEY 1 st rank civil ENGINEERING
I am extremely happy over getting 1 st rank in gate exam .it’s like dream come true .I am very grateful to vani institute . Material provided to me is really very useful and apt to prepare well for the exam .vani institute’s guidance is awesome
Thanks to vani institute provided best online test series platform to avoid silly mistakes. Test series also as per real gate exam pattern, study material helped me to reduced my preparation less.

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